Photosensitive composition and article with o-quinone diazide an

Details Photosensitive composition and article with o-quinone diazide an Photosensitive composition and article with o-quinone diazide an

1982-07-07

1984-04-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430192, 430302, G03C 160, G03C 154

Patent

active

044421958

ABSTRACT:
A photosensitive composition for making lithographic printing plate and for use as a photoresist material which comprises a photosensitive o-quinone diazide compound, an alkali-soluble resin, and 0.5 to 20% by weight 6-membered cyclic acid anhydride.

REFERENCES:
patent: 3016298 (1962-01-01), Sanders et al.
patent: 4009033 (1977-02-01), Bakos et al.
patent: 4115128 (1978-09-01), Kita
patent: 4294905 (1981-10-01), Okishi et al.
patent: 4307173 (1981-12-01), Gventer
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1975, p. 257.

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