Photosensitive composition

Details Photosensitive composition Photosensitive composition

1990-01-02

1991-11-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430193, 430195, 430197, 430312, 430313, 430323, 430325, 430326, B03C 160, C03F 708, C08G 7760

Patent

active

050631349

ABSTRACT:
A photosensitive composition contains a polymer having a unit represented by formula I, and a photosensitive agent: ##STR1## wherein each of R.sub.1 to R.sub.4 represents a hydrogen atom, an alkyl group, an alkoxyl group, or a substituted or non-substituted allyl group, at least one of R.sub.1 to R.sub.4 being an alkyl groups having 1 to 10 carbon atoms and containing silicon, l represents a positive integer, and each of a and b represents an integer from 1 to 3, and c represents an integer from 0 to 2, a+b+c not exceeding 4.

REFERENCES:
patent: 4521274 (1985-06-01), Reichmanis et al.
patent: 4536464 (1985-08-01), Nagashima et al.
patent: 4603195 (1986-07-01), Babich et al.
patent: 4624909 (1986-11-01), Saotome et al.
patent: 4722881 (1988-02-01), Ueno et al.
patent: 4788127 (1988-11-01), Bailey et al.
English abstract of Japanese Publication #61-198,151, published 9/2/86 (Mitsubishi Chem.).
English abstract of Japanese Publication #60-59,347, published 4/5/85 (Tanaka).

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