Photosensitive composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Reexamination Certificate

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C430S162000, C430S176000, C430S302000

Reexamination Certificate

active

07049043

ABSTRACT:
The invention provides a photosensitive composition including (A) a vinyl polymer containing a copolymerization component having a carboxyl group, having a content of the carboxyl group in a molecule of 2.0 meq/g or higher and having a solubility parameter less than 21.3 MPa1/2, (B) a polymer compound including a phenolic hydroxyl group, and (C) an IR absorber.

REFERENCES:
patent: 5840467 (1998-11-01), Kitatani et al.
patent: 6238838 (2001-05-01), Gaschler et al.
patent: 6423467 (2002-07-01), Kawauchi et al.
patent: 2003/0194653 (2003-10-01), Takamiya
patent: 2003/0207203 (2003-11-01), Tsuchimura et al.
patent: 1 316 421 (2003-06-01), None
patent: 10-282643 (1998-10-01), None
patent: 2001-324803 (2001-11-01), None
Japanese Abstract No. 2001324808, dated Nov. 22, 2001.

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