Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-05-09
1997-11-25
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 4302701, 4302861, 4302871, 430906, 430909, 430910, G03F 7021, G03F 7023
Patent
active
056911017
ABSTRACT:
Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.
REFERENCES:
patent: 4401743 (1983-08-01), Incremona
patent: 4853314 (1989-08-01), Ruckert et al.
patent: 5262270 (1993-11-01), Walls
patent: 5275907 (1994-01-01), Walls
patent: 5350660 (1994-09-01), Urano et al.
Asakawa Koji
Hongu Akinori
Naito Takuya
Nakase Makoto
Niki Hirokazu
Chu John S.
Kabushiki Kaisha Toshiba
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