Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1978-12-29
1980-10-21
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430270, 430287, 20415911, 20415914, 20415922, G03C 152, G03C 168
Patent
active
042295149
ABSTRACT:
A composition containing a photosensitive polymer which becomes insoluble by a light exposure and particularly to a highly photosensitive composition which comprises a photosensitive polymer having in the structure as photosensitive groups both an a,B-unsaturated ketone group having a cyano group at the a-position and an azide group.
REFERENCES:
patent: 3257664 (1966-06-01), Leubner et al.
patent: 3594348 (1971-07-01), Maar et al.
patent: 3902906 (1975-09-01), Iwama et al.
patent: 4041017 (1977-08-01), Maekawa et al.
Abstract, Journal of National Chem. Laboratory for Industry 68(3) 90 (1973).
Iwaki Akio
Kurita Yoshio
Brammer Jack P.
Konishiroku Photo Industry Co,., Ltd.
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