Photosensitive composition

Details Photosensitive composition Photosensitive composition

1987-01-05

1988-12-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430167, 430191, 430192, 430197, 430325, 430326, 430330, 430331, G03C 160, G03C 1727

Patent

active

047925167

ABSTRACT:
A photosensitive composition comprising (a) a photosensitive component such as an aromatic diazo compound or an aromatic azide, (b) a polymer and (c) a quaternary alkylammonium salt wherein each straight- or branched-chain alkyl group has 1 to 7 carbon atoms is suitable for producing a positive type or negative type photresist excellent in contrast and sensitivity in the microlithography of semiconductor elements.

REFERENCES:
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patent: 4423138 (1983-12-01), Guild
patent: 4500629 (1985-02-01), Irving et al.
patent: 4546066 (1985-10-01), Field et al.
patent: 4565768 (1986-01-01), Nonogaki et al.
patent: 4696891 (1987-09-01), Guzzi
patent: 4728594 (1988-03-01), Nonogaki et al.
Nonogaki, S. et al., SPIE vol. 539 Advances in Resist Technology and Processing II, 1985, pp. 189-193.
West, P. R. et al., ACS Polymer Preprints 26(2), pp. 337-338, 1985.
Iwayanogi, T. et al., IEEE Transactions on Electron Devices, vol. Ed-28, No. 11, 11/1981, pp. 1306-1310.

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