Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1981-07-02
1983-03-22
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430 28, 430144, 430179, G03C 160
Patent
active
043776302
ABSTRACT:
A photosensitive composition improved in sensitivity by adding a salt of a compound represented by the general formula: ##STR1## (wherein R.sub.1 and R.sub.2 each represents a straight chain alkyl group, and X, Y and Z each represents H, a straight chain alkyl group or an alkoxy group, but two or more of X, Y and Z can not be H at the same time) to an aromatic diazonium salt which gets sticky upon exposure to light.
REFERENCES:
patent: 2214559 (1940-09-01), Lecher et al.
patent: 2405523 (1946-08-01), Sease et al.
patent: 2593911 (1952-04-01), Neumann et al.
patent: 2877083 (1959-03-01), Streck
patent: 3202510 (1965-08-01), Hollmann
patent: 3230257 (1966-01-01), Schmerling
patent: 3469984 (1969-09-01), Bialczak
patent: 3501453 (1970-03-01), Steinemann
patent: 3704129 (1972-11-01), deBoer et al.
patent: 4110071 (1978-08-01), Schaub et al.
patent: 4273842 (1981-06-01), Nonogaki et al.
Akagi Motoo
Hayashi Nobuaki
Kohashi Takahiro
Morishita Hajime
Nonogaki Saburo
Bowers Jr. Charles L.
Hitachi , Ltd.
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