Photosensitive composition

Details Photosensitive composition Photosensitive composition

1977-01-18

1978-10-31

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

96115R, 96115P, 96 86P, 96 351, G03C 152

Patent

active

041232763

ABSTRACT:
A photosensitive composition is prepared comprising (a) a copolymer having an acid value of 10 to 100 and containing structural units represented by the following general formula I ##STR1## where R.sub.1 represents a hydrogen atom or methyl group, R.sub.2 represents a hydrogen atom, methyl group, ethyl group or chloromethyl group, and n is an integer of from 1 to 10, inclusive, and structural units represented by the following general formula II ##STR2## where, in the formula, R.sub.3 represents a hydrogen atom or methyl group, and

REFERENCES:
patent: 3060023 (1962-10-01), Burg et al.
patent: 3418295 (1968-12-01), Schoenthaler
patent: 3732105 (1973-05-01), Klupfel et al.
patent: 3778270 (1973-12-01), Roos
patent: 3790382 (1974-02-01), Dahlman
patent: 3841874 (1974-10-01), Nishino

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