Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-04-26
1993-10-19
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430190, 430191, 430193, 430278, 430302, 430326, 430906, 522 97, 522171, 528 51, 528 72, 528 85, G03F 7023, G03F 732, G03C 177
Patent
active
052544320
ABSTRACT:
The present invention relates to a photosensitive composition comprising an o-quinonediazide compound and a polyurethane resin having a phosphonic acid group, a phosphoric acid group or its ester group. The photosensitive composition of the present invention provides an excellent adhesion to the support, an excellent developability with an aqueous alkali developer, and a high printing durability.
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Bowers Jr. Charles L.
Chu John S.
Fuji Photo Film Co. , Ltd.
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