Photosensitive composition

Details Photosensitive composition Photosensitive composition

1980-11-14

1984-04-10

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430197, 430270, 430287, 20415911, 20415914, 20415922, 260349, G03C 152

Patent

active

044421966

ABSTRACT:
The main photosensitive ingredient of the photosensitive composition is prepared by subjecting a polymer, which is obtained by homopolymerizing, or copolymerizing with another copolymerizable monomer, a monomer of the general formula ##STR1## in which R represents a hydrogen atom, a halogen atom, or an alkyl group, Y represents a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group, p is 0 or 1, and when p=1, X represents a divalent organic group, to reaction with p-azidocinnamylidene-.alpha.-cyanoacetic chloride in the presence of an organic or inorganic base.

REFERENCES:
patent: 3257664 (1966-06-01), Leubner
patent: 3395120 (1968-07-01), Bremmer et al.
patent: 3804862 (1974-04-01), Fetscher et al.
patent: 3843603 (1974-10-01), Gates
patent: 3933885 (1976-01-01), Satomura
patent: 4229514 (1980-10-01), Kurita
Journal of Polymer Science, Part B, vol. 9, pp. 81-83 (1971).
Journal of Polymer Science, Part A, vol. 10, pp. 2379-2387 (1972).

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