Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-05-28
1981-12-15
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430302, 528162, G03C 154, C08G 832, C08G 820
Patent
active
043060110
ABSTRACT:
A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonyl chloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as 2-methyl resorcinol with an aldehyde or ketone.
REFERENCES:
patent: 3046120 (1962-07-01), Schmidt et al.
patent: 3635709 (1972-01-01), Kobayashi
patent: 3647443 (1972-03-01), Rauner et al.
patent: 4123279 (1978-10-01), Kobayashi
Derwent Publication Ltd., No. 52914v/29, Jap. Pat. No. 49-24361, 6/1974.
Iwaki Akio
Matsuzaki Masatoshi
Ogawa Yoko
Shimada Fumio
Uehara Masafumi
Bowers Jr. Charles L.
Konishiroku Photo Industry Co,., Ltd.
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