Photosensitive bis-azide composition with acrylic terpolymer and

Details Photosensitive bis-azide composition with acrylic terpolymer and Photosensitive bis-azide composition with acrylic terpolymer and

1980-10-24

1982-06-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

Using specified radiation-sensitive composition other than a...

430 25, 430 29, 430196, 430197, 430281, 430283, 430325, 430919, G03C 171, G03C 178, G03C 500

Patent

active

043328741

ABSTRACT:
Disclosed are a photosensitive composition comprising a copolymer comprising acrylamide, diacetone-acrylamide and a sulfonated vinyl monomer, such as sodium p-styrenesulfonate, and a water-soluble aromatic bisazide compound, and a pattern-forming method using this photosensitive composition.
This photosensitive composition has a reciprocity law failure, and when this photosensitive composition is used, the development after light exposure is completed in a short time.

REFERENCES:
patent: 3694383 (1972-09-01), Azami et al.
patent: 3748132 (1973-07-01), Arcesi et al.
patent: 3892570 (1975-07-01), Monahan
patent: 3917794 (1975-11-01), Akagi et al.
patent: 4086090 (1978-04-01), Kohashi et al.
patent: 4191571 (1980-03-01), Nonogaki et al.
patent: 4241162 (1980-12-01), Hatano et al.

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