Photoresists, fluoropolymers and processes for 157 nm...

Details Photoresists, fluoropolymers and processes for 157 nm... Photoresists, fluoropolymers and processes for 157 nm...

2003-08-08

2008-08-05

Mulcahy, Peter D. (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S247000, C526S249000, C526S255000

Reexamination Certificate

active

07408011

ABSTRACT:
The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure: (I) wherein n is 0, 1, or 2; and R2to R4are independently H; C1-C10alkyl or alkoxy, optionally substituted by halogen or ether oxygens; or C6-C20aryl. These polymers can be used in making photoresist compositions and coated substrates.

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