Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent
1996-06-19
2000-03-14
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
430197, 4302701, 4302771, 4302781, 101457, B41N 104, G03C 177
Patent
active
060370858
ABSTRACT:
Printing plates having a photoresist layer thereon that can be exposed by a computer controller laser have improved sensitivity and do not require a photomask step. We have found photoresists that include a film forming polymer, an organo azide and a photosensitive dye that absorbs light at the frequency of the patterning laser and converts it to heat energy. The heat energy in turn elevates the temperature of the organo azide above its dissociation temperature, destroying the azide in areas exposed to the light source, and solubilizing those regions. A post pattern exposure flood exposure with ultraviolet light hardens the unexposed resist, improving its resistance to etch solvents.
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Holman, III Bruce
Mulvey Merlin L.
Sharkozy Larry
Zaloom Jeffrey G.
Zhou Peiguang
Codd Bernard
Morris Birgit E.
Plantamura Arthur J.
Printing Development Inc.
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