Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-09-04
1998-03-03
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7023
Patent
active
057232547
ABSTRACT:
The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a low molecular weight phenol having from one to three aryl groups and from one to three hydroxyl groups. A third photoactive component which may be present in the formulation is the esterification product of an o-quinonediazide sulfonyl compound with a relative high molecular weight, polyhydric, polynuclear phenol.
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Derwent Publications Ltd., London, "Photosensitive Composition for Lithographic Plates", & JP-A-50 036 203, Apr. 5, 1975 Abstract.
Meister Catherine C.
Trefonas, III Peter
Turci Pamela
Vizvary Gerald C.
Zampini Anthony
Chu John S.
Goldberg Robert L.
Shipley Company L.L.C.
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