Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2008-04-15
2008-04-15
Chu, John S. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S270100, C430S323000, C430S326000
Reexamination Certificate
active
11372370
ABSTRACT:
A material comprising a specific bisphenol compound with a group of many carbon atoms is useful in forming a photoresist undercoat. The undercoat-forming material, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm and a high etching resistance as demonstrated by slow etching rates with CF4/CHF3and Cl2/BCl3gases for substrate processing.
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Chu John S.
Shin-Etsu Chemical Co. , Ltd.
Westerman, Hattori, Daniels & Adrian , LLP.
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