Photoresist supply system with air venting

Details Photoresist supply system with air venting Photoresist supply system with air venting

1998-11-20

2000-01-25

Edwards, Laura

Coating apparatus

With treatment of coating material

118612, 118 52, B05C 2100

Patent

active

060173939

ABSTRACT:
A system for pumping resist to a wafer coating machine includes a line that returns a selected proportion of the resist entering the resist pump to the resist supply tank. The return line to the tank is connected to the pump outlet at a higher point than the pump outlet to the wafer coating machine, and the resist that is returned to the tank carries substantially all of the bubbles that are carried in the resist entering the tank. The bubbles are removed from the resist in the tank and the resist can be used normally.

REFERENCES:
patent: 5127362 (1992-07-01), Iwatsu et al.
patent: 5254367 (1993-10-01), Matsumura et al.
patent: 5262068 (1993-11-01), Bowers et al.
patent: 5814051 (1998-09-01), Lee et al.

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