Photoresist supply apparatus and method of controlling the...

Coating apparatus – Program – cyclic – or time control – Having prerecorded program medium

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S702000, C118S703000, C239S120000, C222S055000, C222S065000, C222S064000

Reexamination Certificate

active

07014715

ABSTRACT:
A photoresist supply apparatus of semiconductor coating equipment fills a supply pipe with new photoresist when a used photoresist bottle is replaced. The photoresist supply apparatus includes first and second photoresist bottles, first and second gas supply pipes connected to the bottles, first and second solenoid valves disposed along the gas supply pipes, first and second purge start buttons, first and second photoresist supply pipes, first and second trap tanks to which the supply pipes are connected, a third photoresist supply pipe connected to the trap tanks, a nozzle connected to the third photoresist supply pipe, first and second level sensors disposed at an upper level of the trap tanks, third and fourth level sensors disposed at a lower level of the trap tank, first and second discharge pipes connected to the trap tanks, third and fourth solenoid valves disposed along the discharge pipes, first and second drain sensors associated with the discharge pipes, and a controller.

REFERENCES:
patent: 5636762 (1997-06-01), Juhola et al.
patent: 6033475 (2000-03-01), Hasebe et al.
patent: 6524597 (2003-02-01), Kashimoto
patent: 6554579 (2003-04-01), Martin et al.
patent: 2002/0050247 (2002-05-01), Sekiguchi et al.
patent: 2004/0067307 (2004-04-01), Lee et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photoresist supply apparatus and method of controlling the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist supply apparatus and method of controlling the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist supply apparatus and method of controlling the... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3610673

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.