Photoresist stripping compositions

Details Photoresist stripping compositions Photoresist stripping compositions

1990-01-18

1991-02-12

Chaudhuri, Olik

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

252142, 252171, 430329, C11D 112, C23G 102

Patent

active

049921088

ABSTRACT:
A non-aqueous biodegradable negative photoresist stripping composition having low toxicity and is operable at temperatures at 85.degree. C. or less which comprises about 85% by weight of an aromatic hydrocarbon solvent of the formula selected from the group consisting of: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each is a member selected from the group consisting of methyl, ethyl n-propyl and isopropyl, and an organic sulfonic acid of the formula:

REFERENCES:
patent: 4070203 (1978-01-01), Neisius
patent: 4165294 (1979-08-01), Vander Mey
patent: 4165295 (1979-08-01), Vander Mey
patent: 4215005 (1980-07-01), Vander Mey
patent: 4221674 (1980-09-01), Vander Mey
patent: 4242218 (1980-12-01), Vander Mey
patent: 4395348 (1983-07-01), Lee
patent: 4491530 (1985-01-01), Thomas
patent: 4881798 (1989-11-01), Yuasa
patent: 4944893 (1990-07-01), Tanaka

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