Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2006-05-23
2006-05-23
Webb, Gregory E. (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S175000, C510S255000, C510S245000, C510S499000, C134S001300, C134S002000
Reexamination Certificate
active
07049275
ABSTRACT:
The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1:wherein R1to R3are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7:wherein R2to R5and n are as defined in the specification, is a novel compound.
REFERENCES:
patent: 5567574 (1996-10-01), Hasemi et al.
patent: 5989353 (1999-11-01), Skee et al.
patent: 6413647 (2002-07-01), Hayashi et al.
Ikemoto Kazuto
Maruyama Taketo
Yamamoto Yoshiaki
Yoshida Hiroshi
Antonelli, Terry Stout and Kraus, LLP.
Mitsubishi Gas Chemical Company Inc.
Webb Gregory E.
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