Photoresist stripping composition

Details Photoresist stripping composition Photoresist stripping composition

1998-02-24

1999-01-26

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 2, 510176, 510201, B08B 304, B08B 308, C11D 170, C11D 183

Patent

active

058633464

ABSTRACT:
A non-aqueous negative photoresist stripping composition which consists essentially of about 40 to 80% by weight of an alkylnaphthalene solvent, about 5 to 20% by weight of an alkyl phenol which provides a corrosion inhibitory effect, about 5 to 20% by weight of a linear monoalkylbenzene sulfonic acid which is a surfactant and about 1 to 10% by weight of a dialkylbenzene sulfonic acid. There is further provided a process for removing coatings from a photoresist with the compositions of the invention.

REFERENCES:
patent: 3871929 (1975-03-01), Schevey et al.
patent: 4215005 (1980-07-01), Vander Mey
patent: 4844832 (1989-07-01), Kobayashi et al.
patent: 4992108 (1991-02-01), Ward et al.

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