Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1996-01-23
1997-09-09
Lieberman, Paul
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
106 1416, 510402, 510477, 510499, 544196, C11D 726, C11D 732, C11D 750
Patent
active
056656882
ABSTRACT:
A photoresist stripping composition containing:
(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;
(b) 70-20% by weight of alkanolamine compounds; and
(c) 0.1-10% by weight of 6,6',6"-(1,3,5-triazine-2,4,6-triyltriimino) tris(hexanoic acid).
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Honda Kenji
Maw Taishih
Perry Donald F.
Delcotto Gregory R.
Lieberman Paul
Olin Microelectronics Chemicals, Inc.
Simons William A.
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