Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1996-09-06
1998-06-02
McGinty, Douglas J.
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510175, 134 2, 134 38, 134 42, C11D 712, C11D 726, C11D 750
Patent
active
057599734
ABSTRACT:
A stripping and cleaning composition comprising water, at least one amine compound, and at least one corrosion inhibitor selected from (a) quaternary ammonium silicate and (b) a catechol nucleus-containing oligomer having a molecular weight of about 220 to about 5,000, and optionally a polar organic solvent.
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"Development Of Advanced Corrosion Free Organic Strippers For ULSI Processing" by A.L.P. Rotondaro, K. Honda, T. Maw, D. Perry, M. Lux, M.M. Heyns. C. Claeys and I. Daraktchiev, appearing at Fourth International Symposium On Cleaning Technology In Semiconductor Device Manufacturing, Oct. 1995, Chicago, Illinois.
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"Thin Film Pitting: Is NMP the Culprit?", by Dr. Franco T. Lee, Dr. David R. Wanlass and B. Walsh, appearing in Semiconductor International, Jun. 1994.
Honda Kenji
Maw Taishih
Perry Donald F.
McGinty Douglas J.
Olin Microelectronic Chemicals, Inc.
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