Photoresist stripper with dodecylsulfonic acid and chlorinated s

Details Photoresist stripper with dodecylsulfonic acid and chlorinated s Photoresist stripper with dodecylsulfonic acid and chlorinated s

1978-07-26

1980-02-05

Pitlick, Harris A.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

134 3, 134 38, 134 42, 252171, 252554, C23G 502, B08B 308

Patent

active

041871910

ABSTRACT:
A stripper for removing a photoresist mask. The stripper consists essentially, by volume, of about 50-85% tetrachloroethylene and ortho-dichlorobenzene in generally equal amounts, about 15-50% dodecylsulfonic acid, and up to 3% formic acid.

REFERENCES:
patent: 3075923 (1963-01-01), Berst et al.
patent: 3582401 (1971-06-01), Berilla et al.
patent: 3871929 (1975-03-01), Schevey et al.
patent: 3988256 (1976-10-01), Vandermey et al.
patent: 4070203 (1978-01-01), Neisius et al.
patent: 4087370 (1978-05-01), Singalewitch et al.

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