Photoresist stripper systems

Details Photoresist stripper systems Photoresist stripper systems

1976-04-13

1978-05-02

Pitlick, Harris A.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

134 3, 134 38, 134 41, 134 42, 252170, 252171, B08B 308, C23G 502, C11D 726

Patent

active

040873706

ABSTRACT:
This relates to a method and solution for removing exposed photopolymer film resist from a substrate. The substrate having the photoresist thereon is contacted with a solution consisting essentially of acid selected from the group consisting of the first three carboxylic acids and their halogenated derivatives, alcohol selected from the group consisting of the simple alcohols containing one to four carbon atoms per molecule and their halogenated derivatives, and water.

REFERENCES:
patent: 3988256 (1976-10-01), Vandermey et al.

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