Photoresist stripper rinse

Compositions – Water-softening or purifying or scale-inhibiting agents

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Details

134 38, 134 42, 252DIG9, 252DIG14, C23G 502

Patent

active

039882560

ABSTRACT:
A process for removing a photoresist stripper from a substrate comprising rinsing the substrate with a composition comprising from about 65 to about 98.5 weight percent methylene chloride and from about 1.5 to about 35 weight percent of an alcohol selected from the group consisting of isopropanol, tertiary butanol and mixtures thereof.

REFERENCES:
patent: 3338756 (1967-08-01), Leon
patent: 3600322 (1971-08-01), Morison
patent: 3737386 (1973-06-01), Geiss et al.
patent: 3789007 (1974-01-01), Robinson

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