Photoresist stripper comprising a pyrrolidinone, a diethylene gl

Details Photoresist stripper comprising a pyrrolidinone, a diethylene gl Photoresist stripper comprising a pyrrolidinone, a diethylene gl

1986-04-30

1988-05-17

Albrecht, Dennis

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

252153, 252158, 252170, 252171, 252542, 252DIG8, 430256, 430329, 430331, C09D 900, C11D 752, C23D 1700, G03C 1112

Patent

active

047448342

ABSTRACT:
A composition of matter is set forth which is useful for removing a photoresist material from a substrate. The composition comprises 10 to 90% by weight of a 2-pyrrolidinone compound of the formula ##STR1## 10 to 30% by weight of a diethylene glycol monalkyl ether of the formula

REFERENCES:
patent: 3673099 (1972-06-01), Corby
patent: 4276186 (1981-06-01), Bakos
patent: 4428871 (1984-01-01), Ward

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