Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant
Patent
1990-05-01
1992-02-25
Lieberman, Paul
Compositions
Compositions containing a single chemical reactant or plural...
Organic reactant
252153, 252156, 252158, 252170, 252172, 252DIG8, C09D 900, C11D 750, C11D 732
Patent
active
050911031
ABSTRACT:
Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105.degree. C.-125.degree. C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.
REFERENCES:
patent: 3673099 (1972-06-01), Corby et al.
patent: 4906303 (1990-03-01), Freis
Dean Alicia
Fitzsimmons John A.
Havas Janos
McCormick Barry C.
Shah Prabodh R.
Lieberman Paul
Parks William S.
Stemwedel John A.
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