Semiconductor device manufacturing: process – Including control responsive to sensed condition – Interconnecting plural devices on semiconductor substrate
Patent
1996-03-20
1998-08-11
Robinson, Douglas W.
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Interconnecting plural devices on semiconductor substrate
438622, 437228, H01L 21465
Patent
active
057926727
ABSTRACT:
An improved method for removing a photoresist mask from an etched aluminum pattern after etching the pattern in a chlorine containing plasma has been created. The method is a two step process, in which a first stripping step is in a plasma containing O.sub.2 and H.sub.2 O and a second stripping step is in a plasma containing O.sub.2.
REFERENCES:
patent: 4732658 (1988-03-01), Lee
Chan Lap
Chan Tony
Meng Simon Chooi Yen
Ackerman Stephen B.
Chartered Semiconductor Manufacturing Ltd.
Robinson Douglas W.
Saile George O.
White Everett
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