Photoresist solution storage and supply device

Fluid handling – Diverse fluid containing pressure systems – Gas pressure storage over or displacement of liquid

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137392, 141 59, 141 65, 141 66, 396632, 417 36, 417 441, F16K 3102, F16K 3112

Patent

active

058710280

ABSTRACT:
A photoresist storage and supply device. The device includes a control unit for generating a number of on/off signals. A number of gas supply valves are open to let gas pass according to the on/off signals. A number of photoresist solution storage vessels store photoresist solution and receive the gas from a corresponding gas supply valve. A buffer vessel receives the photoresist solution, under pressure of the gas, from a selected photoresist solution storage vessel. A liquid level sensor mounted on the buffer vessel detects the solution level in the buffer vessel and generates a control signal when the photoresist solution level in the buffer vessel is below a certain threshold. A gas exhaust valve is coupled to the control unit, and expels gas from inside the buffer vessel according to an on/off signal.

REFERENCES:
patent: 3049887 (1962-08-01), Sharp
patent: 3222578 (1965-12-01), Thiele
patent: 3626970 (1971-12-01), Jones
patent: 4398554 (1983-08-01), Kondo
patent: 4841321 (1989-06-01), Kose et al.
patent: 4859375 (1989-08-01), Lipisko et al.

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