Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2008-04-08
2010-10-19
Webb, Gregory E (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C134S001300, C252S079100, C252S079400
Reexamination Certificate
active
07816313
ABSTRACT:
A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the composition including one or two or more types of inorganic acid and one or two or more types of inorganic fluorine compound. There is also provided a process for producing a semiconductor circuit element wherein, in a step of forming wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the photoresist residue remover composition is used for removing a photoresist residue formed by a resist ashing treatment after dry etching.
REFERENCES:
patent: 6518142 (2003-02-01), Yamamoto
patent: 6605230 (2003-08-01), Liaw et al.
patent: 6777380 (2004-08-01), Small et al.
patent: 7456140 (2008-11-01), Small et al.
patent: 2002/0037820 (2002-03-01), Small et al.
patent: 2002/0072235 (2002-06-01), Haga et al.
patent: 2002/0086552 (2002-07-01), Saito et al.
patent: 2002/0137357 (2002-09-01), Chen et al.
patent: 2003/0211678 (2003-11-01), Chen et al.
patent: 2004/0016719 (2004-01-01), Liaw et al.
patent: 2005/0089489 (2005-04-01), Carter
patent: 2005/0202987 (2005-09-01), Small et al.
patent: 2005/0209118 (2005-09-01), Kawamoto et al.
patent: 2005/0287480 (2005-12-01), Takashima
patent: 2008/0171682 (2008-07-01), Kane et al.
patent: 2008/0318424 (2008-12-01), Kawamoto et al.
patent: 2009/0246967 (2009-10-01), Yaguchi et al.
Ishikawa Norio
Kawamoto Hiroshi
Miyasato Mikie
Oowada Takuo
Kabushiki Kaisha Toshiba
Kanto Kagaku Kabushiki Kaisha
L.C. Begin & Associates, PLLC.
Webb Gregory E
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