Photoresist process and photosensitive O-quinone diazide article

Gas separation: apparatus – Electric field separation apparatus – Electrode cleaner – apparatus part flusher – discharger – or...

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96 362, 96 49, 96 75, 96 91D, G03C 534, G03C 160

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active

040366448

ABSTRACT:
Carboxylic acids are included in resists to increase their speed and adhesion.

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Noller, C. R., "Textbook of Organic Chemistry," 2nd Ed., W. B. Saunders Co., 1951, pp. 111-112.

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