Photoresist of polyvinyl alcohol and ferric dichromate

Details Photoresist of polyvinyl alcohol and ferric dichromate Photoresist of polyvinyl alcohol and ferric dichromate

1978-04-05

1981-09-08

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

Using specified radiation-sensitive composition other than a...

20415914, 20415924, 430270, 430909, 430914, 430926, 430927, G03C 500, G03C 168

Patent

active

042885132

ABSTRACT:
To accelerate printing of resist materials on a CRT color panel, an additive is incorporated into the resist to enhance cross-linking upon exposure to actinic radiation.

REFERENCES:
patent: 1892682 (1933-01-01), Richards
patent: 3317319 (1967-05-01), Mayaud
patent: 3615458 (1971-10-01), Dykstra
patent: 3658534 (1972-04-01), Ishitani et al.
patent: 3966474 (1976-06-01), Harper
Tritton; F. J., "The Photographic Journal", 6/29, pp. 281-285.
Kosar; J., "Light-Sensitive Systems", 1965, pp. 14, 25-26.

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