Photoresist materials and processes of using with photosensitive

Details Photoresist materials and processes of using with photosensitive Photoresist materials and processes of using with photosensitive

1978-03-13

1983-10-25

Bowers, Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430158, 430191, 430192, 430275, 430276, 430270, 430325, 430326, 430335, 430336, 430340, 430343, 430 8, 430321, 430323, G03C 154, G03C 160, G03C 172, G03C 500

Patent

active

044119780

ABSTRACT:
A photosensitive recording material which includes in a supported layer a mixture of photosensitive substances in admixture with one or more polymers that are soluble in an alkaline aqueous liquid, characterized in that such mixture of photosensitive substances essentially consists of:
(A) at least one photosensitive nitrone of the formula: ##STR1## in which: R is an aromatic hydrocarbon group including a substituted aromatic hydrocarbon group,

REFERENCES:
patent: 2426894 (1947-09-01), McQueen
patent: 3416922 (1968-12-01), Sus et al.
patent: 3455914 (1969-07-01), Ruckert
patent: 3481739 (1969-12-01), Wainer et al.
patent: 3494767 (1970-02-01), Lavidon et al.
patent: 3751285 (1973-08-01), Ruckert et al.
patent: 3827887 (1974-08-01), Hazy et al.
patent: 3890152 (1975-06-01), Ruckert et al.
patent: 4008084 (1977-02-01), Ikada et al.
patent: 4105450 (1978-08-01), Shinozaki et al.
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, pp. 359, 360 and 396.

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