Photoresist mask/smoothing layer ensuring the field...

Details Photoresist mask/smoothing layer ensuring the field... Photoresist mask/smoothing layer ensuring the field...

2006-08-08

2006-08-08

Williams, Joseph (Department: 2879)

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

Reexamination Certificate

active

07086917

ABSTRACT:
A method of making an organic light emitting device (OLED) is disclosed wherein an inert insulating conformal smoothing layer is deposited over a protruding structure. The smoothing layer is patterned to expose portions of the structure underlying the smoothing layer and defining active regions of the device. The inert smoothing layer is treated, preferably by heat reflow, to taper the layer over the stepped edges of the structure on the exposed portions. Additional layers are then deposited over the smoothing layer and the exposed portions of the structure. The smoothing layer blunts all underlying layer edges and provides sloped edges wherever a step occurs from one layer to another. This effect results in a homogeneous field across the pixel and the continuity in the layers deposited after the photoresist layer.

REFERENCES:
patent: 5488497 (1996-01-01), Takanashi et al.
patent: 6069443 (2000-05-01), Jones et al.
Shimoda, Tatsuya et al., “High resolution light emitting polymer display driven by low temperature polysilicon thin film transistor with integrated driver”, Asia Display 98, pp. 217-220, no month.

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