Photoresist laminate including photoimageable adhesive layer

Details Photoresist laminate including photoimageable adhesive layer Photoresist laminate including photoimageable adhesive layer

1993-04-02

1995-05-16

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Element

430156, 430162, 430175, 430176, 430258, 430273, 430287, 430909, G03F 7095, G03F 7021

Patent

active

054159717

ABSTRACT:
A photosensitive mask laminate having a photoimageable, pressure sensitive adhesive layer and a photoimageable masking layer is disclosed. The laminate also includes a support layer, and it can include a removable carrier layer and a release layer. The laminate can be imaged by selective exposure to light or other radiation, and developing the laminate produces a mask having void and mask areas. The mask can then be used to protect selected portions of a target surface during a sandblast decorative process.

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