Photoresist dispenser with nozzle arrangement for...

Details Photoresist dispenser with nozzle arrangement for... Photoresist dispenser with nozzle arrangement for...

2009-01-12

2011-10-04

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

Having self cleaning means

C134S199000, C118S070000

Reexamination Certificate

active

08028709

ABSTRACT:
A cleaning system which can be integrated into a coater track system for use in the production of semiconductor devices and methods for its use are provided. The cleaning system can include a series of nozzles having assorted configurations and features which provide uniform and efficient rinsing of excess material.

REFERENCES:
patent: 4033869 (1977-07-01), McGrew
patent: 4674521 (1987-06-01), Paulfus
patent: 6398879 (2002-06-01), Satou et al.
patent: 6599560 (2003-07-01), Daggett et al.
patent: 7157386 (2007-01-01), Andres et al.
patent: 2003/0221712 (2003-12-01), Yang et al.
patent: 2002143749 (2002-05-01), None

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