Photoresist dispense pump

Pumps – Expansible chamber type – Having separate noncyclic valve

Patent

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Details

417473, 4175551, F04B 45027, F04B 5310

Patent

active

060710942

ABSTRACT:
A photoresist dispense pump receives photoresist from two pipelines, a first pipeline and a second pipeline, and pumps out the photoresist through a third pipeline. The photoresist dispense pump contains a first bellows and a second bellows receiving photoresist from the second pipeline, wherein the first bellows and the second bellows are separated by a partition. Photoresist is fed into the third pipeline from the second bellows. On the center region of the partition, there is a central diaphragm that allows photoresist to flow in a direction from the first bellows toward the second bellows, but not in the reverse direction.

REFERENCES:
patent: 1580479 (1926-04-01), Frankenfield
patent: 4139333 (1979-02-01), Sipos
patent: 4597719 (1986-07-01), Tano

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