Photoresist developable in aqueous base made from acid-functiona

Details Photoresist developable in aqueous base made from acid-functiona Photoresist developable in aqueous base made from acid-functiona

1997-06-19

1999-07-20

Sellers, Robert E.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

522 53, 522169, 522170, 525481, 525502, 525524, 525527, 525529, 525533, 528109, 523404, 523414, C08G 5916, C08K 320, C08L 6302, C08L 6304

Patent

active

059257199

ABSTRACT:
A substantially ester-free, acid-functional thiol-functional resin is prepared via the reaction of an epoxy compound with a thiolacetic acid in the presence of an amine catalyst and heat to form a thioacetate derivative which is hydrolyzed to yield an ester-free, .beta.-hydroxy thiol-functional resin. The .beta.-hydroxy thiol-functional resin can then be reacted with a material capable of insert a group conferring aqueous-base developability such as a cyclic anhydride.

REFERENCES:
patent: 2943095 (1960-04-01), Farnham et al.
patent: 2943096 (1960-04-01), Reinking
patent: 3258495 (1966-06-01), Le Fave et al.
patent: 3904499 (1975-09-01), Morgan
patent: 4006270 (1977-02-01), Morgan
patent: 4020233 (1977-04-01), Morgan
patent: 4135047 (1979-01-01), Morgan
patent: 4591522 (1986-05-01), Kang
patent: 5019483 (1991-05-01), Lin et al.
Epoxy Resins--Their Applications and Technology, H. Lee and K. Neville, ed., McGraw-Hill Book Co., Inc., New York, NY, pp. 21-22. (1957).

Affiliated with

Also associated with

Rating

Photoresist developable in aqueous base made from acid-functiona does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist developable in aqueous base made from acid-functiona, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist developable in aqueous base made from acid-functiona will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1322634