Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1979-06-19
1981-09-01
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430197, 430519, 430926, 430927, 430311, G03C 170, G03C 171
Patent
active
042872898
ABSTRACT:
A novel photoresist composition is proposed which is very advantageously employed in the photoetching process for the manufacture of various kinds of electronic devices such as transistors, ICs, LSIs and the like. The photoresist composition of the invention comprises a cyclized rubber as the base component and a specified azobenzene compound as a photoextinction agent for preventing halation in the exposure of the photoresist films to ultraviolet light. The advantages of the inventive photoresist composition over the conventional ones are obtained in the remarkable stability of the halation preventing effect even after a prebaking treatment of the photoresist films at an elevated temperature to remove the solvent from the photoresist films applied on to the substrate surfaces owing to the unexpectedly small sublimation of the azobenzene compound contained in the photoresist films.
REFERENCES:
patent: 2852379 (1958-09-01), Hepher et al.
patent: 3567453 (1971-03-01), Borden
patent: 4075019 (1978-02-01), Do Minh
Bowers Jr. Charles L.
Tokyo Ohka Kogyo Kabushiki Kaisha
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