Photoresist compositions with a bis-benzotriazole

Details Photoresist compositions with a bis-benzotriazole Photoresist compositions with a bis-benzotriazole

1987-09-22

1989-10-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430189, 430192, 430190, 430300, 430302, 430325, 430326, 430331, G03C 160

Patent

active

048716448

ABSTRACT:
Photoresist compositions which operate positively and contain at least one ocmpound of the formula I ##STR1## in which X is --C.sub.n H.sub.2n --, --O--, --S-- or --C(O)--, n being a number from 1 to 6. These compositions are particularly suitable for use as positively-operating copying lacquers.

REFERENCES:
patent: 2754209 (1956-07-01), Schmidt et al.
patent: 3046110 (1962-07-01), Schmidt
patent: 3046112 (1962-07-01), Schmidt et al.
patent: 3046113 (1962-07-01), Schmidt et al.
patent: 3046116 (1962-07-01), Schmidt
patent: 3046118 (1962-07-01), Schmidt
patent: 3046119 (1962-07-01), Sus
patent: 3046120 (1962-07-01), Schmidt et al.
patent: 3531414 (1970-09-01), Randell et al.
patent: 3637584 (1972-01-01), Hurlock et al.
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3661582 (1972-05-01), Broyde
patent: 3759711 (1973-09-01), Rauner et al.
patent: 3859099 (1975-01-01), Petropoulos et al.
patent: 4059449 (1979-11-01), Rosenkranz et al.
patent: 4141733 (1979-02-01), Guild
patent: 4365019 (1982-12-01), Daly et al.
Chem. Abst., 59 4663a.
Chem. Abst., 69, 32036g (1968).
Chem. Abst., 72, 61420v (1970).
Chem. Abst., 73, 20460k (1970).

Affiliated with

Also associated with

Rating

Photoresist compositions with a bis-benzotriazole does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist compositions with a bis-benzotriazole, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist compositions with a bis-benzotriazole will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-663660