Photoresist compositions based on hydroxystyrene copolymers

Details Photoresist compositions based on hydroxystyrene copolymers Photoresist compositions based on hydroxystyrene copolymers

1988-01-25

1989-09-26

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430286, 430287, 526313, G03C 152, G03C 168

Patent

active

048699942

ABSTRACT:
Negative photoresist compositions are made from copolymers of 4-hydroxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer.
Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.

REFERENCES:
patent: 4405708 (1983-09-01), Van Pelt et al.
patent: 4663268 (1987-05-01), Turner et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4678843 (1987-07-01), Elmore et al
patent: 4740451 (1988-04-01), Kohara

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