Photoresist compositions based on acetoxystyrene copolymers

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430325, G03C 168, G03C 516

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active

048247588

ABSTRACT:
Negative photoresist compositions are made from copolymers of 4-acetoxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer.
Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.

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patent: 4469778 (1984-09-01), Iwayanagi et al.
patent: 4491628 (1985-01-01), Ito et al.
The Journal of Photographical Science, vol. 12, p. 181, (1964).
The Journal of the Electrochemical Society, vol. 124, p. 1394, (1977).

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