Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-01-25
1989-04-25
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430325, G03C 168, G03C 516
Patent
active
048247588
ABSTRACT:
Negative photoresist compositions are made from copolymers of 4-acetoxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer.
Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.
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patent: 3882084 (1975-05-01), Tato et al.
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patent: 4409317 (1983-10-01), Shiraishi
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patent: 4491628 (1985-01-01), Ito et al.
The Journal of Photographical Science, vol. 12, p. 181, (1964).
The Journal of the Electrochemical Society, vol. 124, p. 1394, (1977).
Gupta Balaram
Kalyanaraman Palaiyur
Chea Thorl
Hoechst Celanese Corp
Michl Paul R.
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