Photoresist compositions and processes for preparing the same

Details Photoresist compositions and processes for preparing the same Photoresist compositions and processes for preparing the same

2006-03-29

2010-11-16

Cheung, William K (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S222000, C526S319000, C526S346000

Reexamination Certificate

active

07834113

ABSTRACT:
The present invention relates to novel photoresist compositions and processes for preparing the same utilizing polymers having a low polydispersity via the use of certain chain transfer agents (CTA) with certain monomers to provide said polymers. The polymers incorporating the chain transfer agents can be homopolymers, or made with additional monomers to provide copolymers. These polymers/copolymers are then converted into photoresist compositions for use as such.

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