Photoresist compositions

Details Photoresist compositions Photoresist compositions

1997-02-26

1999-07-27

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

4302701, 430326, 430905, 522 31, 522 33, G03F 7004

Patent

active

059288183

ABSTRACT:
Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR1## in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, methyl or halogen, R.sub.5 and R.sub.6 independently of one another are C.sub.1 -C.sub.6 alkyl, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 independently of one another are hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient ##EQU1## which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10.ltoreq.Q.ltoreq.0.50, are suitable as binders for DUV photoresists of high processing stability and flow resistance.

REFERENCES:
patent: 4603101 (1986-07-01), Crivello
patent: 5286600 (1994-02-01), Ochiai et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5362600 (1994-11-01), Sinta et al.
patent: 5403695 (1995-04-01), Hayase et al.
European Search Report for European Patent Application EP 95 30 9073 dated May 13, 1996.

Affiliated with

Also associated with

Rating

Photoresist compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-876973