Photoresist composition with water soluble bisazide and diazo co

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430 28, 430143, 430145, 430175, 430179, 430194, 430196, 430197, G03C 154, G03C 160, G03C 171

Patent

active

045268541

ABSTRACT:
A method for forming a pattern of a non-light-emitting black material on the inner surface of a faceplate of a color cathode ray tube is provided, which comprises the steps of forming a photoresist layer of a photoresist containing a water-soluble bisazidocompound, a water-soluble diazocompound, and a water-soluble polymeric material, on an inner surface of a faceplate of a color cathode ray tube, selectively exposing parts of the photoresist layer using a shadow mask so as to photocure the exposed parts, developing the photoresist layer to remove unexposed parts of the photoresist layer, thereby forming dots of the photoresist, forming a film of a non-light-emitting black material on the inner surface of the faceplate including the dots, and removing the dots and the non-light-emitting black material on the dots so as to form holes in the film of the non-light-emitting black material.

REFERENCES:
patent: 2695846 (1954-11-01), Mally
patent: 2937085 (1960-05-01), Seven et al.
patent: 3387975 (1968-06-01), Tamura
patent: 3679419 (1972-07-01), Gillich
patent: 3917794 (1975-11-01), Akagi et al.
patent: 4347300 (1982-08-01), Shimazu et al.
Research Disclosure, No. 134, pp. 48-49, 6/1975.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photoresist composition with water soluble bisazide and diazo co does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist composition with water soluble bisazide and diazo co, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist composition with water soluble bisazide and diazo co will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-381379

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.