Photoresist composition with copolymer binder having a major pro

Details Photoresist composition with copolymer binder having a major pro Photoresist composition with copolymer binder having a major pro

1989-05-22

1992-07-07

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430193, 430270, 430326, 430909, 430905, G03C 152, G03C 1492

Patent

active

051282321

ABSTRACT:
A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.

REFERENCES:
patent: 4148654 (1979-04-01), Oddi
patent: 4439516 (1984-03-01), Carnigliaro et al.
patent: 4506006 (1985-03-01), Ruckert et al.
patent: 4576901 (1986-03-01), Stahlhofen et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4720445 (1988-01-01), Brahim et al.
patent: 4857435 (1989-08-01), Hopf et al.

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