Photoresist composition with azide having alkoxy silane as adhes

Details Photoresist composition with azide having alkoxy silane as adhes Photoresist composition with azide having alkoxy silane as adhes

1985-01-14

1986-06-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 28, 430167, 430272, G03C 171, G03C 160

Patent

active

045967555

ABSTRACT:
A photoresist composition, comprising, a water-soluble azide compound and a water-soluble polymer in combination with a water-soluble silane compound having at least two alkoxysilane groups.

REFERENCES:
patent: 3549368 (1970-12-01), Collins et al.
patent: 3586554 (1971-06-01), Couture et al.
patent: 3702766 (1972-11-01), Dunham et al.
patent: 3758306 (1973-09-01), Roos
patent: 3909265 (1975-09-01), Miyano et al.
patent: 3945830 (1976-03-01), Yazowa et al.
patent: 3953212 (1976-04-01), Miyano et al.
patent: 4099973 (1978-07-01), Miura et al.
patent: 4491629 (1985-01-01), Koike et al.

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