Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-05-13
1995-05-30
Bowers, Jr., Charles J.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430167, 430193, 430197, G03F 7012, G03F 7023
Patent
active
054199956
ABSTRACT:
A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an aldehyde. Additional useful resins may be formed by further reacting the alternating copolymer with a second reactive phenol in the presence of an aldehyde to form substantially block copolymers. The use of these resins in photoresist formulations leads to improved thermal properties, etch resistance and photospeed.
REFERENCES:
patent: 2437710 (1948-03-01), Rhodes
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4529682 (1985-07-01), Toukhy
patent: 4587196 (1986-05-01), Toukhy
patent: 4614826 (1986-09-01), Katayama et al.
patent: 4690882 (1987-09-01), Tanigaki et al.
patent: 4837121 (1989-06-01), Blakeney et al.
patent: 5238776 (1993-08-01), Zampini
Bowers, Jr. Charles J.
Goldberg Robert L.
Shipley Company Inc.
Young Christopher G.
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