Photoresist composition including polyphenol and sensitizer

Details Photoresist composition including polyphenol and sensitizer Photoresist composition including polyphenol and sensitizer

1991-11-13

1993-05-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 430270, 430326, 430138, G03F 7023, G03F 732

Patent

active

052120449

ABSTRACT:
A photoresist composition, and a process for using the same are; the composition comprises a polyphenolic resin and a sensitizer effective, when exposed to actinic radiation, to provide alkali solubility to said composition, wherein said resin is represented by the formula (I) or (II): ##STR1## wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkaryl group or an aryl group; R' is a silyl group; and n and n'+m are greater than 3. The composition exhibits high thermal and plasmal resistance and good dissolution characteristics.

REFERENCES:
patent: 3929488 (1975-12-01), Smith
patent: 4296194 (1981-10-01), Harper et al.
patent: 4529682 (1985-07-01), Toukhy
patent: 4624909 (1986-11-01), Saotome et al.
patent: 4647952 (1987-03-01), Pokora et al.
patent: 4760048 (1988-07-01), Kurihara et al.

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